Fluidized-bed nitridation of silicon : direct use of very fine powder for [��]-silicon nitride production

2 ��m average sized silicon powder was nitrided with 90% N���/10% H��� in a fluidized-bed reactor, operated at 1200��C, 1250��C and 1300��C. To fluidize silicon powder, alumina particles with an average size of 300 ��m were used as an inert fluidizing conditioner. The feasibility and operating condi...

Full description

Bibliographic Details
Main Author: Liu, Yao-Dian
Other Authors: Kimura, Shoichi
Language:en_US
Published: 2012
Subjects:
Online Access:http://hdl.handle.net/1957/34388
id ndltd-ORGSU-oai-ir.library.oregonstate.edu-1957-34388
record_format oai_dc
spelling ndltd-ORGSU-oai-ir.library.oregonstate.edu-1957-343882012-10-13T03:13:20ZFluidized-bed nitridation of silicon : direct use of very fine powder for [��]-silicon nitride productionLiu, Yao-DianFluidizationSilicon nitride2 ��m average sized silicon powder was nitrided with 90% N���/10% H��� in a fluidized-bed reactor, operated at 1200��C, 1250��C and 1300��C. To fluidize silicon powder, alumina particles with an average size of 300 ��m were used as an inert fluidizing conditioner. The feasibility and operating conditions of the fluidization were studied at room temperature. The effects of silicon content and operating temperature on the nitridation of silicon as well as on the formation of ��- and ��-silicon nitride were investigated in batch and semi-continuous operations. The effects of the average residence time of silicon/alumina mixtures in the fluidized-bed reactor on the nitridation process were studied in semi-continuous operations. In batch operations, a maximum mass fraction of 15 wt% silicon powder could be added to alumina particles at temperatures in the range of 1200 to 1300��C without changing the fluidization quality. When the silicon fraction was increased to 20 wt%, fluidization failed immediately. With a mass fraction of 5% silicon powder, almost 100% ��-silicon nitride, which was preferred in applications, was found in the product. ��-silicon nitride was facilitated with an increase in silicon fractions in silicon/alumina mixtures. The nitridation process was strongly affected by the reaction temperature. The overall conversion of silicon increased with an increase in reaction temperature. Higher temperature also promoted the formation of ��-silicon nitride. The overall conversion of silicon into silicon nitride was also enhanced by hydrogen concentrations. An increase in hydrogen concentration facilitated the formation of ��-form silicon nitride. In the semi-continuous operation, the nitridation of 30 wt% silicon/70 wt% alumina mixtures could be achieved without changing the fluidizing quality. Almost 100% ��-silicon nitride was found in the product when a 20 wt% silicon/80 wt% alumina mixture was nitrided at 1250��C for an average residence time of up to 4 hours. However, ��-silicon nitride was formed when the mixture was nitrided at 1300��C for an average residence time of 3 hours. A mathematical model incorporating kinetic data and carryover of silicon powder was developed to described the total conversion of silicon in batch operation. A semi-continuous model was also proposed, which successfully predicted the overall conversion of silicon powder.Graduation date: 1997Kimura, Shoichi2012-10-12T19:38:12Z2012-10-12T19:38:12Z1996-11-011996-11-01Thesis/Dissertationhttp://hdl.handle.net/1957/34388en_US
collection NDLTD
language en_US
sources NDLTD
topic Fluidization
Silicon nitride
spellingShingle Fluidization
Silicon nitride
Liu, Yao-Dian
Fluidized-bed nitridation of silicon : direct use of very fine powder for [��]-silicon nitride production
description 2 ��m average sized silicon powder was nitrided with 90% N���/10% H��� in a fluidized-bed reactor, operated at 1200��C, 1250��C and 1300��C. To fluidize silicon powder, alumina particles with an average size of 300 ��m were used as an inert fluidizing conditioner. The feasibility and operating conditions of the fluidization were studied at room temperature. The effects of silicon content and operating temperature on the nitridation of silicon as well as on the formation of ��- and ��-silicon nitride were investigated in batch and semi-continuous operations. The effects of the average residence time of silicon/alumina mixtures in the fluidized-bed reactor on the nitridation process were studied in semi-continuous operations. In batch operations, a maximum mass fraction of 15 wt% silicon powder could be added to alumina particles at temperatures in the range of 1200 to 1300��C without changing the fluidization quality. When the silicon fraction was increased to 20 wt%, fluidization failed immediately. With a mass fraction of 5% silicon powder, almost 100% ��-silicon nitride, which was preferred in applications, was found in the product. ��-silicon nitride was facilitated with an increase in silicon fractions in silicon/alumina mixtures. The nitridation process was strongly affected by the reaction temperature. The overall conversion of silicon increased with an increase in reaction temperature. Higher temperature also promoted the formation of ��-silicon nitride. The overall conversion of silicon into silicon nitride was also enhanced by hydrogen concentrations. An increase in hydrogen concentration facilitated the formation of ��-form silicon nitride. In the semi-continuous operation, the nitridation of 30 wt% silicon/70 wt% alumina mixtures could be achieved without changing the fluidizing quality. Almost 100% ��-silicon nitride was found in the product when a 20 wt% silicon/80 wt% alumina mixture was nitrided at 1250��C for an average residence time of up to 4 hours. However, ��-silicon nitride was formed when the mixture was nitrided at 1300��C for an average residence time of 3 hours. A mathematical model incorporating kinetic data and carryover of silicon powder was developed to described the total conversion of silicon in batch operation. A semi-continuous model was also proposed, which successfully predicted the overall conversion of silicon powder. === Graduation date: 1997
author2 Kimura, Shoichi
author_facet Kimura, Shoichi
Liu, Yao-Dian
author Liu, Yao-Dian
author_sort Liu, Yao-Dian
title Fluidized-bed nitridation of silicon : direct use of very fine powder for [��]-silicon nitride production
title_short Fluidized-bed nitridation of silicon : direct use of very fine powder for [��]-silicon nitride production
title_full Fluidized-bed nitridation of silicon : direct use of very fine powder for [��]-silicon nitride production
title_fullStr Fluidized-bed nitridation of silicon : direct use of very fine powder for [��]-silicon nitride production
title_full_unstemmed Fluidized-bed nitridation of silicon : direct use of very fine powder for [��]-silicon nitride production
title_sort fluidized-bed nitridation of silicon : direct use of very fine powder for [��]-silicon nitride production
publishDate 2012
url http://hdl.handle.net/1957/34388
work_keys_str_mv AT liuyaodian fluidizedbednitridationofsilicondirectuseofveryfinepowderforsiliconnitrideproduction
_version_ 1716393316883365888