Experimental and numerical investigation of nanoparticle removal using acoustic streaming and the effect of time
Theremoval of nanoparticles is becoming increasingly challenging as the minimumlinewidth continues to decrease in semiconductor manufacturing. In this paper,the removal of nanoparticles from flat substrates using acoustic streamingis investigated. Bare silicon wafers and masks with a 4 nmsilicon cap...
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| Online Access: | http://hdl.handle.net/2047/d20000924 |