Nanoscale particle removal using conventional and hybrid laser shockwave cleaning
As surface contamination by submicron particulates becomes a critical issue in semiconductor industry, efforts have been made to develop noncontact effective laser-based cleaning techniques. The laser shockwave cleaning (LSC) process is one of the promising techniques that has been demonstrated to b...
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| Online Access: | http://hdl.handle.net/2047/d20000983 |