Modeling and analysis of extrusion-spin coating : an efficient and deterministic photoresist coating method in microlithography
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 2001. === Includes bibliographical references (p. 173-178). === In the fabrication of microelectronic chips, microlithography is used to transfer a pattern of circuit geometry from mask to semiconductor wafer. A...
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| Format: | Others |
| Language: | English |
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Massachusetts Institute of Technology
2005
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| Online Access: | http://hdl.handle.net/1721.1/8694 |