Modeling of chemical mechanical polishing for shallow trench isolation

Modeling of chemical mechanical polishing for shallow trench isolation

Thesis (S.B. and M.Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2000. === Includes bibliographical references (p. 75-77). === by Terence Gan. === S.B.and M.Eng.

Bibliographic Details
Main Author: Gan, Terence (Terence Chihkiong), 1975-
Other Authors: Duane S. Boning.
Format: Others
Language:English
Published: Massachusetts Institute of Technology 2014
Subjects:
Electrical Engineering and Computer Science.
Online Access:http://hdl.handle.net/1721.1/86469

Internet

http://hdl.handle.net/1721.1/86469

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