Low-voltage spatial-phase-locked scanning-electron-beam lithography
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2010. === Includes bibliographical references (p. 63-64). === Spatial-phase-locked electron-beam lithography (SPLEBL) is a method that tracks and corrects the position of an electron-beam in r...
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| Format: | Others |
| Language: | English |
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Massachusetts Institute of Technology
2010
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| Online Access: | http://hdl.handle.net/1721.1/60159 |