Single- and few-layer graphene by ambient pressure chemical vapor deposition on nickel
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2010. === Includes bibliographical references (p. 169-177). === An ambient pressure chemical vapor deposition (APCVD) process is used to fabricate graphene based films consisting of one to several gra...
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| Format: | Others |
| Language: | English |
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Massachusetts Institute of Technology
2010
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| Online Access: | http://hdl.handle.net/1721.1/59230 |