Non-perfluorocompound chemistries for dielectric etching applications
Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1998. === Includes bibliographical references (p. 99-101). === by Laura C. Pruette. === M.S.
Main Author: | Pruette, Laura C. (Laura Catherine), 1974- |
---|---|
Other Authors: | Rafael Reif. |
Format: | Others |
Language: | English |
Published: |
Massachusetts Institute of Technology
2009
|
Subjects: | |
Online Access: | http://hdl.handle.net/1721.1/50031 |
Similar Items
-
Non-perfluorocompound chemistries for plasma etching of dielectrics
by: Tao, Benjamin A. (Benjamin Albert)
Published: (2008) -
Oxide etching with NF₃ hydrocarbon chemistries for global warming emissions reduction
by: Pruette, Laura C. (Laura Catherine), 1974-
Published: (2014) -
Evaluation of unsaturated fluorocarbons for dielectric Etch applications
by: Chatterjee, Ritwik, 1974-
Published: (2014) -
Development of novel alternative chemistry processes for dielectric etch applications
by: Karecki, Simon Martin
Published: (2005) -
Alternative chemistries for etching of silicon dioxide and silicon nitride
by: Karecki, Simon Martin
Published: (2008)