Self assembly of block copolymers : applicability in microelectronics and gains for patterned media
Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2008. === Includes bibliographical references (leaves 88-93). === As device size decreases, conventional lithographic methods are finding it increasingly hard to keep up. Introduction of newer method...
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| Format: | Others |
| Language: | English |
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Massachusetts Institute of Technology
2009
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| Online Access: | http://hdl.handle.net/1721.1/45348 |