Ultra-high precision scanning beam interference lithography and its application : spatial frequency multiplication
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 2008. === Includes bibliographical references (p. 135-138). === Scanning beam interference lithography (SBIL) is a technique developed at MIT in 2003. The SBIL system, referred to as the Nanoruler, could fabrica...
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| Format: | Others |
| Language: | English |
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Massachusetts Institute of Technology
2009
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| Online Access: | http://hdl.handle.net/1721.1/44756 |