pH-sensitive resist materials for combined photolithographic patterning of proteins and fluid lipid bilayers
Thesis (S.B.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2008. === Includes bibliographical references (p. 33-34). === Photolithography of a pH-sensitive photoresist polymer was performed to pattern both lipid bilayers and proteins onto the same surface. The...
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ndltd-MIT-oai-dspace.mit.edu-1721.1-432082019-05-02T15:58:55Z pH-sensitive resist materials for combined photolithographic patterning of proteins and fluid lipid bilayers Shah, Mirat Darrell J. Irvine. Massachusetts Institute of Technology. Dept. of Materials Science and Engineering. Massachusetts Institute of Technology. Dept. of Materials Science and Engineering. Materials Science and Engineering. Thesis (S.B.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2008. Includes bibliographical references (p. 33-34). Photolithography of a pH-sensitive photoresist polymer was performed to pattern both lipid bilayers and proteins onto the same surface. The motivation behind this was to create a substrate mimicking an array of antigen- presenting cells. The substrate would consist of signaling ligand, biotin anti- CD3, bound to a lipid bilayer in a regular array of patches. The fluidity of the lipid bilayer would impart mobility to the signaling ligand. It was found that under appropriate substrate fabrication conditions, lipid bilayers and their associated ligand do segregate to the desired signaling patches. Additionally, the bilayer in these regions is fluid, and is potentially bioactive. This bodes well for our system as a future platform to study the actions of the helper T cell and antigen- presenting cell at the immunological synapse. by Mirat Shah. S.B. 2008-11-07T19:16:03Z 2008-11-07T19:16:03Z 2008 2008 Thesis http://hdl.handle.net/1721.1/43208 259127759 eng M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 34 p. application/pdf Massachusetts Institute of Technology |
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Materials Science and Engineering. Shah, Mirat pH-sensitive resist materials for combined photolithographic patterning of proteins and fluid lipid bilayers |
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Thesis (S.B.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2008. === Includes bibliographical references (p. 33-34). === Photolithography of a pH-sensitive photoresist polymer was performed to pattern both lipid bilayers and proteins onto the same surface. The motivation behind this was to create a substrate mimicking an array of antigen- presenting cells. The substrate would consist of signaling ligand, biotin anti- CD3, bound to a lipid bilayer in a regular array of patches. The fluidity of the lipid bilayer would impart mobility to the signaling ligand. It was found that under appropriate substrate fabrication conditions, lipid bilayers and their associated ligand do segregate to the desired signaling patches. Additionally, the bilayer in these regions is fluid, and is potentially bioactive. This bodes well for our system as a future platform to study the actions of the helper T cell and antigen- presenting cell at the immunological synapse. === by Mirat Shah. === S.B. |
author2 |
Darrell J. Irvine. |
author_facet |
Darrell J. Irvine. Shah, Mirat |
author |
Shah, Mirat |
author_sort |
Shah, Mirat |
title |
pH-sensitive resist materials for combined photolithographic patterning of proteins and fluid lipid bilayers |
title_short |
pH-sensitive resist materials for combined photolithographic patterning of proteins and fluid lipid bilayers |
title_full |
pH-sensitive resist materials for combined photolithographic patterning of proteins and fluid lipid bilayers |
title_fullStr |
pH-sensitive resist materials for combined photolithographic patterning of proteins and fluid lipid bilayers |
title_full_unstemmed |
pH-sensitive resist materials for combined photolithographic patterning of proteins and fluid lipid bilayers |
title_sort |
ph-sensitive resist materials for combined photolithographic patterning of proteins and fluid lipid bilayers |
publisher |
Massachusetts Institute of Technology |
publishDate |
2008 |
url |
http://hdl.handle.net/1721.1/43208 |
work_keys_str_mv |
AT shahmirat phsensitiveresistmaterialsforcombinedphotolithographicpatterningofproteinsandfluidlipidbilayers |
_version_ |
1719032487121780736 |