pH-sensitive resist materials for combined photolithographic patterning of proteins and fluid lipid bilayers

Thesis (S.B.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2008. === Includes bibliographical references (p. 33-34). === Photolithography of a pH-sensitive photoresist polymer was performed to pattern both lipid bilayers and proteins onto the same surface. The...

Full description

Bibliographic Details
Main Author: Shah, Mirat
Other Authors: Darrell J. Irvine.
Format: Others
Language:English
Published: Massachusetts Institute of Technology 2008
Subjects:
Online Access:http://hdl.handle.net/1721.1/43208
id ndltd-MIT-oai-dspace.mit.edu-1721.1-43208
record_format oai_dc
spelling ndltd-MIT-oai-dspace.mit.edu-1721.1-432082019-05-02T15:58:55Z pH-sensitive resist materials for combined photolithographic patterning of proteins and fluid lipid bilayers Shah, Mirat Darrell J. Irvine. Massachusetts Institute of Technology. Dept. of Materials Science and Engineering. Massachusetts Institute of Technology. Dept. of Materials Science and Engineering. Materials Science and Engineering. Thesis (S.B.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2008. Includes bibliographical references (p. 33-34). Photolithography of a pH-sensitive photoresist polymer was performed to pattern both lipid bilayers and proteins onto the same surface. The motivation behind this was to create a substrate mimicking an array of antigen- presenting cells. The substrate would consist of signaling ligand, biotin anti- CD3, bound to a lipid bilayer in a regular array of patches. The fluidity of the lipid bilayer would impart mobility to the signaling ligand. It was found that under appropriate substrate fabrication conditions, lipid bilayers and their associated ligand do segregate to the desired signaling patches. Additionally, the bilayer in these regions is fluid, and is potentially bioactive. This bodes well for our system as a future platform to study the actions of the helper T cell and antigen- presenting cell at the immunological synapse. by Mirat Shah. S.B. 2008-11-07T19:16:03Z 2008-11-07T19:16:03Z 2008 2008 Thesis http://hdl.handle.net/1721.1/43208 259127759 eng M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission. http://dspace.mit.edu/handle/1721.1/7582 34 p. application/pdf Massachusetts Institute of Technology
collection NDLTD
language English
format Others
sources NDLTD
topic Materials Science and Engineering.
spellingShingle Materials Science and Engineering.
Shah, Mirat
pH-sensitive resist materials for combined photolithographic patterning of proteins and fluid lipid bilayers
description Thesis (S.B.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2008. === Includes bibliographical references (p. 33-34). === Photolithography of a pH-sensitive photoresist polymer was performed to pattern both lipid bilayers and proteins onto the same surface. The motivation behind this was to create a substrate mimicking an array of antigen- presenting cells. The substrate would consist of signaling ligand, biotin anti- CD3, bound to a lipid bilayer in a regular array of patches. The fluidity of the lipid bilayer would impart mobility to the signaling ligand. It was found that under appropriate substrate fabrication conditions, lipid bilayers and their associated ligand do segregate to the desired signaling patches. Additionally, the bilayer in these regions is fluid, and is potentially bioactive. This bodes well for our system as a future platform to study the actions of the helper T cell and antigen- presenting cell at the immunological synapse. === by Mirat Shah. === S.B.
author2 Darrell J. Irvine.
author_facet Darrell J. Irvine.
Shah, Mirat
author Shah, Mirat
author_sort Shah, Mirat
title pH-sensitive resist materials for combined photolithographic patterning of proteins and fluid lipid bilayers
title_short pH-sensitive resist materials for combined photolithographic patterning of proteins and fluid lipid bilayers
title_full pH-sensitive resist materials for combined photolithographic patterning of proteins and fluid lipid bilayers
title_fullStr pH-sensitive resist materials for combined photolithographic patterning of proteins and fluid lipid bilayers
title_full_unstemmed pH-sensitive resist materials for combined photolithographic patterning of proteins and fluid lipid bilayers
title_sort ph-sensitive resist materials for combined photolithographic patterning of proteins and fluid lipid bilayers
publisher Massachusetts Institute of Technology
publishDate 2008
url http://hdl.handle.net/1721.1/43208
work_keys_str_mv AT shahmirat phsensitiveresistmaterialsforcombinedphotolithographicpatterningofproteinsandfluidlipidbilayers
_version_ 1719032487121780736