pH-sensitive resist materials for combined photolithographic patterning of proteins and fluid lipid bilayers
Thesis (S.B.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2008. === Includes bibliographical references (p. 33-34). === Photolithography of a pH-sensitive photoresist polymer was performed to pattern both lipid bilayers and proteins onto the same surface. The...
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| Format: | Others |
| Language: | English |
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Massachusetts Institute of Technology
2008
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| Online Access: | http://hdl.handle.net/1721.1/43208 |