Characterization of LOCOS and oxidized mesa isolation in deep-sub micrometer SOI NMOS processes

Characterization of LOCOS and oxidized mesa isolation in deep-sub micrometer SOI NMOS processes

Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1995. === Includes bibliographical references (leaves 76-77). === by Jeffrey Wade Thomas. === M.S.

Bibliographic Details
Main Author: Thomas, Jeffrey Wade
Other Authors: James E. Chung.
Format: Others
Language:English
Published: Massachusetts Institute of Technology 2007
Subjects:
Electrical Engineering and Computer Science
Online Access:http://hdl.handle.net/1721.1/38062

Internet

http://hdl.handle.net/1721.1/38062

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