Characterization and modeling of plasma etch pattern dependencies in integrated circuits
Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2006. === Leaf 108 blank. === Includes bibliographical references (leaves 106-107). === A quantitative model capturing pattern dependent effects in plasma etching of integrated circuits (IC...
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| Format: | Others |
| Language: | English |
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Massachusetts Institute of Technology
2007
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| Online Access: | http://hdl.handle.net/1721.1/37054 |