Magnetic properties of lithographically patterned thin film magnetic elements for magnetic random access memory applications

Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2003. === Includes bibliographical references (p. 133-139). === Interference lithography, together with ion beam etching or lift-off processes, has been utilized to produce large area periodic rectang...

Full description

Bibliographic Details
Main Author: Hao, Yaowu, 1969-
Other Authors: Caroline A. Ross.
Format: Others
Language:English
Published: Massachusetts Institute of Technology 2006
Subjects:
Online Access:http://hdl.handle.net/1721.1/29970