Origin, evolution, and control of sidewall line edge roughness transfer during plasma etching
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 2005. === Includes bibliographical references. === (cont.) micromasking. Porous films seem especially prone, perhaps due to polymer diffusion into the pore structure. Control of polymerization during the etch thro...
| Main Author: | |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
Massachusetts Institute of Technology
2005
|
| Subjects: | |
| Online Access: | http://hdl.handle.net/1721.1/28843 |