Pulsed-plasma chemical vapor deposition of organosilicon thin films for dielectric applications
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 2003. === Includes bibliographical references. === As semiconductor feature sizes decrease and feature density increases, the industry is facing the increasing challenge of finding materials that can meet the stri...
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| Format: | Others |
| Language: | English |
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Massachusetts Institute of Technology
2005
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| Online Access: | http://hdl.handle.net/1721.1/17947 |