Xenon difluoride etching and molecular oxygen oxidation of silicon by reactive scattering
Thesis: S.M., Massachusetts Institute of Technology, Department of Chemistry, 2015. === Cataloged from PDF version of thesis. Vita. === Includes bibliographical references. === While both molecular fluorine (F₂) and xenon difluoride (XeF₂) fluorinate Si(l00)2xI surfaces at coverages up to one monola...
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| Format: | Others |
| Language: | English |
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Massachusetts Institute of Technology
2016
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| Online Access: | http://hdl.handle.net/1721.1/101559 |