Work function tuning of reactively sputtered MoxSiyNz metal gate electrodes for advanced CMOS technology

Work function tuning of reactively sputtered MoxSiyNz metal gate electrodes for advanced CMOS technology

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Due to continued transistor scaling, work function tuning of metal gates has become important for advanced CMOS applications. Specifically, this research has been undertaken to discover the tuning of the MoxSiyNz gate work function through the incorporation of nitrogen. Metal Oxide Semiconductor (MO...

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Bibliographic Details
Main Author: Patel, Pommy
Other Authors: Buchanan, Douglas (Electrical and Computer Engineering)
Language:en_US
Published: 2008
Subjects:
microelectronics
CMOS
capacitor
metal work function
Online Access:http://hdl.handle.net/1993/3048

Internet

http://hdl.handle.net/1993/3048

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