Electrical characterization of fluorinated and oxynitrided gate-oxides
Many novel gate oxidation processes have been developed to meet the ongoing quest for thinner and higher-quality gate dielectric layers. Among these processes, fluorination and nitridation methods have emerged as promising techniques for ultra-large scale integrated circuit (ULSI) technology. Report...
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1998
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| Online Access: | http://spectrum.library.concordia.ca/643/1/NQ39024.pdf Nguyen, Tan Khai <http://spectrum.library.concordia.ca/view/creators/Nguyen=3ATan_Khai=3A=3A.html> (1998) Electrical characterization of fluorinated and oxynitrided gate-oxides. PhD thesis, Concordia University. |