Photoelectron experiments and studies of X-ray absorption near edge structure in alkaline-earth and rare-earth flurides
Alkaline-earth fluorides and rare-earth trifluorides possess technological importance for applications in multi-layer electronic device structures and opto-electronic devices. Interfaces between thin films of YbF₃ and Si(111) substrates were studied by photoelectron spectroscopy and x-ray absorpt...
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| Language: | English |
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2009
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| Online Access: | http://hdl.handle.net/2429/6922 |