Advanced methods for GLAD thin films

Advanced methods for GLAD thin films

Thin films are produced from layers of materials ranging from nanometres to micrometres in height. They are increasingly common and are being used in integrated circuit design, optical coatings, protective coatings, and environmental sensing. Thin films can be fabricated using a variety of methods i...

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Bibliographic Details
Main Author: Kupsta, Martin
Other Authors: Dr. Jeremy Sit (Electrical and Computer Engineering)
Format: Others
Language:en
Published: 2010
Subjects:
nanotechnology
reactive ion etching (RIE)
glancing angle deposition (GLAD)
physical vapour deposition (PVD)
thin films
humidity sensing
adatom mobility
substrate heating
substrate cooling
titanium dioxide (TiO2)
microelectrical mechanical systems (MEMS)
Online Access:http://hdl.handle.net/10048/929

Internet

http://hdl.handle.net/10048/929

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