Vapour Pressure Studies Of Precursors And Atomic Layer Deposition Of Titanium Oxides
This thesis describes the deposition of thin films of titanium oxide and Magnéli phases of titanium oxide by atomic layer deposition (ALD) using a novel β-ketoesterate precursor. Titanium oxide is a promising candidate for the high-k dielectric gate oxide layer for CMOS devices in microelectronic ci...
| Main Author: | |
|---|---|
| Other Authors: | |
| Language: | en_US |
| Published: |
2010
|
| Subjects: | |
| Online Access: | http://hdl.handle.net/2005/762 |