Vapour Pressure Studies Of Precursors And Atomic Layer Deposition Of Titanium Oxides

Vapour Pressure Studies Of Precursors And Atomic Layer Deposition Of Titanium Oxides

This thesis describes the deposition of thin films of titanium oxide and Magnéli phases of titanium oxide by atomic layer deposition (ALD) using a novel β-ketoesterate precursor. Titanium oxide is a promising candidate for the high-k dielectric gate oxide layer for CMOS devices in microelectronic ci...

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Bibliographic Details
Main Author: Kunte, Girish V
Other Authors: Umarji, A M
Language:en_US
Published: 2010
Subjects:
Vapour Pressure Deposition
Vacuum Deposition
Thin Film Deposition
Titanium Oxide Deposition
Atomic Layer Deposition (ALD)
Metalorganic Complexes - Synthesis
Titanium Oxide Thin Films
Titanium Oxides - Properties
Titanium Oxide Magneli Phases
Chemical Vapour Deposition (CVD)
Titanium Precursors
Vapour Pressure Determination
Vapour Pressure
Materials Science
Online Access:http://hdl.handle.net/2005/762

Internet

http://hdl.handle.net/2005/762

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