Design of photomodifiable material systems for maskless patterning of functional ceramic and metallic materials at multiple length scales
Silicon and silicon-based materials have been investigated for the fabrication of electronic, optoelectronic, solar, and structural/mechanical devices. To enable the continuous use of silicon-based materials for next generation device applications, new and inexpensive ways of fabricating features of...
Main Author: | Alabi, Taiwo Raphael |
---|---|
Other Authors: | Das, Suman |
Language: | en_US |
Published: |
Georgia Institute of Technology
2014
|
Subjects: | |
Online Access: | http://hdl.handle.net/1853/51709 |
Similar Items
-
A BIOINSPIRED MICRO-COMPOSITE STRUCTURE
by: CHEN, LI
Published: (2005) -
Negative-tone molecular glass photoresist for high-resolution electron beam lithography
by: Yafei Wang, et al.
Published: (2021-03-01) -
Photocrosslinkable polymers for temporally stable organic nonlinear optical materials and dual-tone photolithography
by: Rawlings, Brandon Mark
Published: (2013) -
Surface Attachment of Gold Nanoparticles Guided by Block Copolymer Micellar Films and Its Application in Silicon Etching
by: Mingjie Wei, et al.
Published: (2015-06-01) -
Crystallographically Determined Etching and Its Relevance to the Metal-Assisted Catalytic Etching (MACE) of Silicon Powders
by: Kurt W. Kolasinski, et al.
Published: (2019-01-01)