Toward sub-10 nm lithographic processes: epoxy-based negative tone molecular resists and directed self-assembly (DSA) of high χ block copolymers
It’s becoming more and more difficult to make smaller, denser, and faster computer chips. There’s an increasing demand to design new materials to be applied in current lithographic process to get higher patterning performance. In this work, the aqueous developable single molecule resists were introd...
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| Format: | Others |
| Language: | en_US |
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Georgia Institute of Technology
2013
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| Online Access: | http://hdl.handle.net/1853/49113 |