Nano-heteroepitaxy stress and strain analysis: from molecular dynamic simulations to continuum methods
For decades, epitaxy is used in nanotechnologies and semiconductor fabrications. So far, it's the only affordable method of high quality crystal growth for many semiconductor materials. Heterostructures developed from these make it possible to solve the considerably more general problem of cont...
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Georgia Institute of Technology
2010
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| Online Access: | http://hdl.handle.net/1853/34752 |