Nano-heteroepitaxy stress and strain analysis: from molecular dynamic simulations to continuum methods

For decades, epitaxy is used in nanotechnologies and semiconductor fabrications. So far, it's the only affordable method of high quality crystal growth for many semiconductor materials. Heterostructures developed from these make it possible to solve the considerably more general problem of cont...

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Bibliographic Details
Main Author: Ye, Wei
Published: Georgia Institute of Technology 2010
Subjects:
Online Access:http://hdl.handle.net/1853/34752