Electron-enhanced etching of SI(100) by atomic and molecular hydrogen

Electron-enhanced etching of SI(100) by atomic and molecular hydrogen

Bibliographic Details
Main Author: Clemons, John L.
Published: Georgia Institute of Technology 2009
Subjects:
Atomic beams
Molecular beams
Etching
Online Access:http://hdl.handle.net/1853/30416

Internet

http://hdl.handle.net/1853/30416

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