Anisotropic low-energy electron-enhanced etching of semiconductors in DC plasma

Anisotropic low-energy electron-enhanced etching of semiconductors in DC plasma

Bibliographic Details
Main Author: Steiner, Pinckney Alston, IV
Published: Georgia Institute of Technology 2009
Subjects:
Electronic structure
Plasma etching
Semiconductors Etching
Online Access:http://hdl.handle.net/1853/27060

Internet

http://hdl.handle.net/1853/27060

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