Thin films with high surface roughness: thickness and dielectric function analysis using spectroscopic ellipsometry

Thin films with high surface roughness: thickness and dielectric function analysis using spectroscopic ellipsometry

An optical surface roughness model is presented, which allows a reliable determination of the dielectric function of thin films with high surface roughnesses of more than 10 nm peak to valley distance by means of spectroscopic ellipsometry. Starting from histogram evaluation of atomic force microsco...

Full description

Bibliographic Details
Main Authors: Lehmann, Daniel, Seidel, Falko, Zahn, Dietrich R.T.
Other Authors: TU Chemnitz, Fakultät für Naturwissenschaften
Format: Article
Language:English
Published: Universitätsbibliothek Chemnitz 2014
Subjects:
Rauheit
AFM
RMS
PTCDI
Publikationsfonds
Ellipsometry
Roughness
Thickness
Dielectric function
Publication funds
ddc:500
ddc:530
ddc:535
Ellipsometrie
Rauigkeit
Schichtdicke
Dielektrische Funktion
Online Access:http://nbn-resolving.de/urn:nbn:de:bsz:ch1-qucosa-136724
http://nbn-resolving.de/urn:nbn:de:bsz:ch1-qucosa-136724
http://www.qucosa.de/fileadmin/data/qucosa/documents/13672/Lehmann_et_al_thin_films_SpringerPlus_2014_3%3A82.pdf
http://www.qucosa.de/fileadmin/data/qucosa/documents/13672/signatur.txt.asc

Internet

http://nbn-resolving.de/urn:nbn:de:bsz:ch1-qucosa-136724
http://nbn-resolving.de/urn:nbn:de:bsz:ch1-qucosa-136724
http://www.qucosa.de/fileadmin/data/qucosa/documents/13672/Lehmann_et_al_thin_films_SpringerPlus_2014_3%3A82.pdf
http://www.qucosa.de/fileadmin/data/qucosa/documents/13672/signatur.txt.asc

Similar Items