Application of Watkins’ model of phosphorus- and arsenic-vacancy pairs to the interstitialcy-diffusion of phosphorus and arsenic in silicon

Bibliographic Details
Main Authors:	Yoshida, Masayuki, Matsumoto, Satoru, Tanaka, Shuji
Other Authors:	Yoshida Semiconductor Laboratory,
Format:	Article
Language:	English
Published:	Universitätsbibliothek Leipzig 2015
Subjects:	Diffusion Transport diffusion transport ddc:530
Online Access:	http://nbn-resolving.de/urn:nbn:de:bsz:15-qucosa-185496 http://nbn-resolving.de/urn:nbn:de:bsz:15-qucosa-185496 http://www.qucosa.de/fileadmin/data/qucosa/documents/18549/diff_fund_16%282011%2962.pdf

id	ndltd-DRESDEN-oai-qucosa.de-bsz-15-qucosa-185496
record_format	oai_dc
spelling	ndltd-DRESDEN-oai-qucosa.de-bsz-15-qucosa-1854962015-10-29T03:25:06Z Application of Watkins’ model of phosphorus- and arsenic-vacancy pairs to the interstitialcy-diffusion of phosphorus and arsenic in silicon Yoshida, Masayuki Matsumoto, Satoru Tanaka, Shuji Diffusion Transport diffusion transport ddc:530 Universitätsbibliothek Leipzig Yoshida Semiconductor Laboratory, Keio University, Department of Electronics and Electrical Engineering Universität Leipzig, Fakultät für Physik und Geowissenschaften 2015-10-28 doc-type:article application/pdf http://nbn-resolving.de/urn:nbn:de:bsz:15-qucosa-185496 urn:nbn:de:bsz:15-qucosa-185496 issn:1862-4138 http://www.qucosa.de/fileadmin/data/qucosa/documents/18549/diff_fund_16%282011%2962.pdf Diffusion fundamentals 16 (2011) 62, S. 1-2 eng
collection	NDLTD
language	English
format	Article
sources	NDLTD
topic	Diffusion Transport diffusion transport ddc:530
spellingShingle	Diffusion Transport diffusion transport ddc:530 Yoshida, Masayuki Matsumoto, Satoru Tanaka, Shuji Application of Watkins’ model of phosphorus- and arsenic-vacancy pairs to the interstitialcy-diffusion of phosphorus and arsenic in silicon
author2	Yoshida Semiconductor Laboratory,
author_facet	Yoshida Semiconductor Laboratory, Yoshida, Masayuki Matsumoto, Satoru Tanaka, Shuji
author	Yoshida, Masayuki Matsumoto, Satoru Tanaka, Shuji
author_sort	Yoshida, Masayuki
title	Application of Watkins’ model of phosphorus- and arsenic-vacancy pairs to the interstitialcy-diffusion of phosphorus and arsenic in silicon
title_short	Application of Watkins’ model of phosphorus- and arsenic-vacancy pairs to the interstitialcy-diffusion of phosphorus and arsenic in silicon
title_full	Application of Watkins’ model of phosphorus- and arsenic-vacancy pairs to the interstitialcy-diffusion of phosphorus and arsenic in silicon
title_fullStr	Application of Watkins’ model of phosphorus- and arsenic-vacancy pairs to the interstitialcy-diffusion of phosphorus and arsenic in silicon
title_full_unstemmed	Application of Watkins’ model of phosphorus- and arsenic-vacancy pairs to the interstitialcy-diffusion of phosphorus and arsenic in silicon
title_sort	application of watkins’ model of phosphorus- and arsenic-vacancy pairs to the interstitialcy-diffusion of phosphorus and arsenic in silicon
publisher	Universitätsbibliothek Leipzig
publishDate	2015
url	http://nbn-resolving.de/urn:nbn:de:bsz:15-qucosa-185496 http://nbn-resolving.de/urn:nbn:de:bsz:15-qucosa-185496 http://www.qucosa.de/fileadmin/data/qucosa/documents/18549/diff_fund_16%282011%2962.pdf
work_keys_str_mv	AT yoshidamasayuki applicationofwatkinsmodelofphosphorusandarsenicvacancypairstotheinterstitialcydiffusionofphosphorusandarsenicinsilicon AT matsumotosatoru applicationofwatkinsmodelofphosphorusandarsenicvacancypairstotheinterstitialcydiffusionofphosphorusandarsenicinsilicon AT tanakashuji applicationofwatkinsmodelofphosphorusandarsenicvacancypairstotheinterstitialcydiffusionofphosphorusandarsenicinsilicon
_version_	1718114346507173888

Application of Watkins’ model of phosphorus- and arsenic-vacancy pairs to the interstitialcy-diffusion of phosphorus and arsenic in silicon

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