Nanopatterned polymer brushes by reactive writing

Nanopatterned polymer brushes by reactive writing

Polymer brush patterns were prepared by a combination of electron beam induced damage in self-assembled monolayers (SAMs), creating a stable carbonaceous deposit, and consecutive self-initiated photografting and photopolymerization (SIPGP). This newly applied technique, reactive writing (RW), is inv...

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Bibliographic Details
Main Authors: Nawroth, Jonas F., Neisser, Claudia, Erbe, Artur, Jordan, Rainer
Other Authors: Royal Society of Chemistry,
Format: Article
Language:English
Published: Saechsische Landesbibliothek- Staats- und Universitaetsbibliothek Dresden 2017
Subjects:
Polymerbürstenmuster
kohlenstoffhaltige Ablagerung
TU Dresden
Publikationsfonds
Polymer brush patterns
carbonaceous deposit
photopolymerization
Publishing Fund
ddc:600
rvk:UA 1000
Online Access:http://nbn-resolving.de/urn:nbn:de:bsz:14-qucosa-214281
http://nbn-resolving.de/urn:nbn:de:bsz:14-qucosa-214281
http://www.qucosa.de/fileadmin/data/qucosa/documents/21428/c5nr08282j.pdf

Internet

http://nbn-resolving.de/urn:nbn:de:bsz:14-qucosa-214281
http://nbn-resolving.de/urn:nbn:de:bsz:14-qucosa-214281
http://www.qucosa.de/fileadmin/data/qucosa/documents/21428/c5nr08282j.pdf

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