Echtzeit-in-situ-Messung der Oberflächenbelegung einer Magnetron-Kathode bei der reaktiven Sputter-Abscheidung

Echtzeit-in-situ-Messung der Oberflächenbelegung einer Magnetron-Kathode bei der reaktiven Sputter-Abscheidung

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Reactive Sputtering is a widely used technique in processing of thin compound films. Such films can be sputtered from metal targets, which are comparatively cost efficient. Also the fact that sputtering from metal targets can ccur in the dc mode reduces the cost of the sputtering equipment. To keep...

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Bibliographic Details
Main Author: Güttler, D.
Language:German
Published: Forschungszentrum Dresden-Rossendorf 2010
Subjects:
info:eu-repo/classification/ddc/539
ddc:539
Echtzeit-in-situ-Messung
Reactive Sputtering
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