Diffusion Barriers for VLSI Applications
<p>This thesis is concerned with diffusion barriers in contact structures to semiconductors. Diffusion barriers are indispensable in present contact technologies to preserve device characteristics from the influence of metal-semiconductor interaction during post-metallization processing.</p...
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| Format: | Others |
| Language: | en |
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1988
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| Online Access: | https://thesis.library.caltech.edu/439/3/So_fc_1988.pdf So, Frank Cheung Tao (1988) Diffusion Barriers for VLSI Applications. Dissertation (Ph.D.), California Institute of Technology. doi:10.7907/7ytp-0932. https://resolver.caltech.edu/CaltechETD:etd-02012007-110846 <https://resolver.caltech.edu/CaltechETD:etd-02012007-110846> |
Internet
https://thesis.library.caltech.edu/439/3/So_fc_1988.pdfSo, Frank Cheung Tao (1988) Diffusion Barriers for VLSI Applications. Dissertation (Ph.D.), California Institute of Technology. doi:10.7907/7ytp-0932. https://resolver.caltech.edu/CaltechETD:etd-02012007-110846 <https://resolver.caltech.edu/CaltechETD:etd-02012007-110846>