Amorphous ternary diffusion barriers for silicon metallizations

Amorphous ternary diffusion barriers for silicon metallizations

NOTE: Text or symbols not renderable in plain ASCII are indicated by [...]. Abstract is included in .pdf document. Reactively sputtered from transition-metal silicide or boride targets in [...] discharges, thin amorphous films of TM-Si-N (TM = Mo, Ta, Ti, or W) and W-B-N are investigated. Resisti...

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Bibliographic Details
Main Author: Reid, Jason S.
Format: Others
Published: 1995
Online Access:https://thesis.library.caltech.edu/4183/1/Reid_js_1995.pdf
Reid, Jason S. (1995) Amorphous ternary diffusion barriers for silicon metallizations. Dissertation (Ph.D.), California Institute of Technology. doi:10.7907/4TFH-VM05. https://resolver.caltech.edu/CaltechETD:etd-10192007-131842 <https://resolver.caltech.edu/CaltechETD:etd-10192007-131842>

Internet

https://thesis.library.caltech.edu/4183/1/Reid_js_1995.pdf
Reid, Jason S. (1995) Amorphous ternary diffusion barriers for silicon metallizations. Dissertation (Ph.D.), California Institute of Technology. doi:10.7907/4TFH-VM05. https://resolver.caltech.edu/CaltechETD:etd-10192007-131842 <https://resolver.caltech.edu/CaltechETD:etd-10192007-131842>

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