Reaction Kinetics of Pd and Ti-Al Films on Si
<p>The growth of compound phases from thin film layers of Pd and Ti-Al deposited on Si is described in this work. The growth kinetics and composition of the compound phases were measured utilizing 2 MeV ⁴He backscattering. Crystalline structure and film texture effects of the compounds layers...
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| Format: | Others |
| Language: | en |
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1973
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| Online Access: | https://thesis.library.caltech.edu/1349/1/Bower_rw_1973.pdf Bower, Robert William (1973) Reaction Kinetics of Pd and Ti-Al Films on Si. Dissertation (Ph.D.), California Institute of Technology. doi:10.7907/NY05-4E97. https://resolver.caltech.edu/CaltechETD:etd-04122004-132122 <https://resolver.caltech.edu/CaltechETD:etd-04122004-132122> |
Internet
https://thesis.library.caltech.edu/1349/1/Bower_rw_1973.pdfBower, Robert William (1973) Reaction Kinetics of Pd and Ti-Al Films on Si. Dissertation (Ph.D.), California Institute of Technology. doi:10.7907/NY05-4E97. https://resolver.caltech.edu/CaltechETD:etd-04122004-132122 <https://resolver.caltech.edu/CaltechETD:etd-04122004-132122>