Thin Film Silicide Formation by Thermal Annealing: Study of Kinetics, Moving Species, Impurity Effect, and Electrical Properties

Thin Film Silicide Formation by Thermal Annealing: Study of Kinetics, Moving Species, Impurity Effect, and Electrical Properties

<p>Growth kinetics, dominant moving species (DMS), impurity effect, and electrical properties of thermally formed silicides have been studied by using MeV<sup>4</sup>He<sup>+</sup> Rutherford backscattering spectrometry, <sup>18</sup>O(p,α)<sup>15</...

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Bibliographic Details
Main Author:	Lien, Chuen-Der
Format:	Others
Language:	en
Published:	1985
Online Access:	https://thesis.library.caltech.edu/1178/1/Lien_cd_1985.pdf Lien, Chuen-Der (1985) Thin Film Silicide Formation by Thermal Annealing: Study of Kinetics, Moving Species, Impurity Effect, and Electrical Properties. Dissertation (Ph.D.), California Institute of Technology. doi:10.7907/t5r5-5267. https://resolver.caltech.edu/CaltechETD:etd-03272008-074200 <https://resolver.caltech.edu/CaltechETD:etd-03272008-074200>

Internet

https://thesis.library.caltech.edu/1178/1/Lien_cd_1985.pdf
Lien, Chuen-Der (1985) Thin Film Silicide Formation by Thermal Annealing: Study of Kinetics, Moving Species, Impurity Effect, and Electrical Properties. Dissertation (Ph.D.), California Institute of Technology. doi:10.7907/t5r5-5267. https://resolver.caltech.edu/CaltechETD:etd-03272008-074200 <https://resolver.caltech.edu/CaltechETD:etd-03272008-074200>