DEVELOPMENT OF A SILICON NANOWIRE MASK USING SCANNING PROBE MICROSCOPY
Scanning probe microscopy techniques were used to investigate the desorption of hydrogen passivated silicon to form SiO2 etch masks The application of the etch masks were planned on being used to manufacture silicon nanowires. Low concentration hydrofluoric acid was used to passivate the surface. Th...
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| Format: | Others |
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DigitalCommons@CalPoly
2014
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| Online Access: | https://digitalcommons.calpoly.edu/theses/1283 https://digitalcommons.calpoly.edu/cgi/viewcontent.cgi?article=2402&context=theses |