Dry Lithography of Large-Area, Thin-Film Organic Semiconductors Using Frozen CO[subscript 2] Resists

Dry Lithography of Large-Area, Thin-Film Organic Semiconductors Using Frozen CO[subscript 2] Resists

To address the incompatibility of organic semiconductors with traditional photolithography, an inert, frozen CO[subscript 2] resist is demonstrated that forms an in situ shadow mask. Contact with a room-temperature micro-featured stamp is used to pattern the resist. After thin film deposition, the r...

Full description

Bibliographic Details
Main Authors: Mendoza, Hiroshi A. (Contributor), Ashall, Daniel T. (Author), Yin, Allen S. (Contributor), Baldo, Marc A. (Contributor), Bahlke, Matthias Erhard (Contributor)
Other Authors: Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science (Contributor)
Format: Article
Language:English
Published: Wiley Blackwell, 2013-12-09T14:17:24Z.
Subjects:
Article
Online Access:Get fulltext

Internet

Get fulltext

Similar Items