Assembly of Sub-10-nm Block Copolymer Patterns with Mixed Morphology and Period Using Electron Irradiation and Solvent Annealing

Assembly of Sub-10-nm Block Copolymer Patterns with Mixed Morphology and Period Using Electron Irradiation and Solvent Annealing

Block copolymer self-assembly generates patterns with periodicity in the ∼10-100 nm range and is increasingly recognized as a route to lithographic patterning beyond the resolution of photolithography. Block copolymers naturally produce periodic patterns with a morphology and length-scale determined...

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Bibliographic Details
Main Authors: Son, Jeong Gon (Contributor), Chang, Jae-Byum (Contributor), Berggren, Karl K. (Contributor), Ross, Caroline A. (Contributor)
Other Authors: Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science (Contributor), Massachusetts Institute of Technology. Department of Materials Science and Engineering (Contributor)
Format: Article
Language:English
Published: American Chemical Society (ACS), 2013-09-17T14:53:16Z.
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