Large-area and high-resolution distortion measurement based on moire fringe method for hot embossing process

Large-area and high-resolution distortion measurement based on moire fringe method for hot embossing process

A moiré fringe approach is developed to identify simultaneously the global and local distortions in hot-embossed polymeric samples. A square grid pattern with a pitch of 63.5 μm is hot-embossed on the polymer substrate. When a reference grid, a polymeric film with the same pattern, is placed on top...

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Bibliographic Details
Main Authors: Boning, Duane S. (Contributor), Taylor, Hayden Kingsley (Contributor), Youcef-Toumi, Kamal (Contributor), Xu, Zhiguang (Contributor), Yoon, Soon Fatt (Author)
Other Authors: Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science (Contributor), Massachusetts Institute of Technology. Department of Mechanical Engineering (Contributor)
Format: Article
Language:English
Published: Optical Society of America, 2012-06-15T13:31:57Z.
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