Accurate and Efficient Dynamic Simulations of Ferroelectric Based Electron Devices

In recent years electron devices based on ferroelectric materials have attracted a lot of interest well beyond FeRAM memories. Negative capacitance transistors (NC-FETs) have been investigated as steep slope transistors [1], [2], and Ferroelectric FETs (Fe-FETs) are under intense scrutiny also as sy...

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Bibliographic Details
Main Authors: Rollo, T. (Author), Daniel, Luca (Contributor), Esseni, D. (Author)
Other Authors: Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science (Contributor)
Format: Article
Language:English
Published: Institute of Electrical and Electronics Engineers (IEEE), 2021-06-15T20:02:16Z.
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Online Access:Get fulltext
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100 1 0 |a Rollo, T.  |e author 
100 1 0 |a Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science  |e contributor 
100 1 0 |a Daniel, Luca  |e contributor 
700 1 0 |a Daniel, Luca  |e author 
700 1 0 |a Esseni, D.  |e author 
245 0 0 |a Accurate and Efficient Dynamic Simulations of Ferroelectric Based Electron Devices 
260 |b Institute of Electrical and Electronics Engineers (IEEE),   |c 2021-06-15T20:02:16Z. 
856 |z Get fulltext  |u https://hdl.handle.net/1721.1/130948 
520 |a In recent years electron devices based on ferroelectric materials have attracted a lot of interest well beyond FeRAM memories. Negative capacitance transistors (NC-FETs) have been investigated as steep slope transistors [1], [2], and Ferroelectric FETs (Fe-FETs) are under intense scrutiny also as synaptic devices for neuromorphc computing, where the minor loops in ferroelectrics can allow to achieve multiple values of conductance in read mode [3], [4], [5]. Furthermore, the persistence of ferroelectricity in ultra-thin ferroelectric layers paved the way to ferroelectric tunnelling junctions [6], where a polarization dependent tunneling current can be exploited to realize high impedance memristors, amenable for ultra power-efficient and thus massive parallel computation. 
655 7 |a Article 
773 |t 2019 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)