UV-solvent annealing for morphology and orientation control in self-assembled PS-PDMS thin films

UV-solvent annealing for morphology and orientation control in self-assembled PS-PDMS thin films

The response of polystyrene-block-poly(dimethylsiloxane) (PS-b-PDMS) thin films to UV exposure during solvent vapor annealing is described, in order to improve their applicability in nanolithography and nanofabrication. Two BCPs were examined, one with the PS block as majority (f[subscript PS] = 68%...

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Bibliographic Details
Main Authors: Ntetsikas, K (Author), Liontos, G (Author), Avgeropoulos, A (Author), Lee, Keehong (Contributor), Kreider, Melissa E. (Contributor), Bai, Wubin (Contributor), Cheng, Li-Chen (Contributor), Dinachali, Saman Safari (Contributor), Tu, Kun-Hua (Contributor), Huang, Tao (Contributor), Ross, Caroline A (Contributor)
Other Authors: Massachusetts Institute of Technology. Department of Chemical Engineering (Contributor), Massachusetts Institute of Technology. Department of Materials Science and Engineering (Contributor)
Format: Article
Language:English
Published: IOP Publishing, 2017-10-18T17:49:28Z.
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