Nanotextured Shrink Wrap Superhydrophobic Surfaces by Argon Plasma Etching
We present a rapid, simple, and scalable approach to achieve superhydrophobic (SH) substrates directly in commodity shrink wrap film utilizing Argon (Ar) plasma. Ar plasma treatment creates a stiff skin layer on the surface of the shrink film. When the film shrinks, the mismatch in stiffness between...
Main Authors: | , , , , , , |
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Format: | Article |
Language: | English |
Published: |
MDPI AG
2016-03-01
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Series: | Materials |
Subjects: | |
Online Access: | http://www.mdpi.com/1996-1944/9/3/196 |