Micromanufacturing in Fused Silica via Femtosecond Laser Irradiation Followed by Gas-Phase Chemical Etching

Micromanufacturing in Fused Silica via Femtosecond Laser Irradiation Followed by Gas-Phase Chemical Etching

Femtosecond laser irradiation followed by chemical etching (FLICE) with hydrogen fluoride (HF) is an emerging technique for the fabrication of directly buried, three-dimensional microfluidic channels in silica. The procedure, as described in literature, consists of irradiating a silica slab followed...

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Bibliographic Details
Main Authors: Walter Navarrini, Giulio Cerullo, Roberto Osellame, Rebeca Martinez Vazquez, Francesco Venturini, Maurizio Sansotera
Format: Article
Language:English
Published: MDPI AG 2012-09-01
Series:Micromachines
Subjects:
laser micromachining
FLICE
silicon dioxide
selective etching
anhydrous hydrogen fluoride
Online Access:http://www.mdpi.com/2072-666X/3/4/604

Internet

http://www.mdpi.com/2072-666X/3/4/604

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