Fabrication and Evaluation of Trimethylmethoxysilane (TMMOS)-Derived Membranes for Gas Separation

Fabrication and Evaluation of Trimethylmethoxysilane (TMMOS)-Derived Membranes for Gas Separation

Gas separation membranes were fabricated with varying trimethylmethoxysilane (TMMOS)/tetraethoxy orthosilicate (TEOS) ratios by a chemical vapor deposition (CVD) method at 650 &#176;C and atmospheric pressure. The membrane had a high H<sub>2</sub> permeance of 8.3 &#215; 10<su...

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Bibliographic Details
Main Authors: Yoshihiro Mise, So-Jin Ahn, Atsushi Takagaki, Ryuji Kikuchi, Shigeo Ted Oyama
Format: Article
Language:English
Published: MDPI AG 2019-09-01
Series:Membranes
Subjects:
silica-based membrane
hydrogen separation
CVD
pore size control
trimethylmethoxisilane
separation mechanism
Online Access:https://www.mdpi.com/2077-0375/9/10/123

Internet

https://www.mdpi.com/2077-0375/9/10/123

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