Epitaxial ferroelectric oxides on silicon with perspectives for future device applications

Epitaxial ferroelectric oxides on silicon with perspectives for future device applications

Functional oxides on silicon have been the subject of in-depth research for more than 20 years. Much of this research has been focused on the quality of the integration of materials due to their intrinsic thermodynamic incompatibility, which has hindered the flourishing of the field of research. Nev...

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Bibliographic Details
Main Authors: Matjaž Spreitzer, Dejan Klement, Tjaša Parkelj Potočnik, Urška Trstenjak, Zoran Jovanović, Minh Duc Nguyen, Huiyu Yuan, Johan Evert ten Elshof, Evert Houwman, Gertjan Koster, Guus Rijnders, Jean Fompeyrine, Lior Kornblum, David P. Fenning, Yunting Liang, Wen-Yi Tong, Philippe Ghosez
Format: Article
Language:English
Published: AIP Publishing LLC 2021-04-01
Series:APL Materials
Online Access:http://dx.doi.org/10.1063/5.0039161

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http://dx.doi.org/10.1063/5.0039161

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