Evolution of interface chemistry and dielectric properties of HfO2/Ge gate stack modulated by Gd incorporation and thermal annealing
In current work, effects of rapid thermal annealing (RTA) on the interface chemistry and electrical properties of Gd-doped HfO2 (HGO)/Ge stack have been investigated systematically. It has been demonstrated that the presence of GeOx interfacial layer between HfGdO and Ge is unavoidable and appropria...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2016-02-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/1.4941698 |