Tailoring Heterovalent Interface Formation with Light

Abstract Integrating different semiconductor materials into an epitaxial device structure offers additional degrees of freedom to select for optimal material properties in each layer. However, interfaces between materials with different valences (i.e. III-V, II-VI and IV semiconductors) can be diffi...

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Bibliographic Details
Main Authors: Kwangwook Park, Kirstin Alberi
Format: Article
Language:English
Published: Nature Publishing Group 2017-08-01
Series:Scientific Reports
Online Access:https://doi.org/10.1038/s41598-017-07670-2